Adisyn Ltd (ASX: AI1) (“Adisyn” or “the Company”) is pleased to announce the company has achieved a major technical milestone in the development of its graphene semiconductor technology, having successfully scaled its low-temperature graphene deposition process to a full 200mm Cu semiconductor wafer. The deposition was done below 300°C. The achievement represents a significant increase from the Company’s earlier laboratory-scale work and moves Adisyn’s technology into an industry-standard wafer format widely used across global semiconductor manufacturing.
This the first publicly disclosed demonstration of low-temperature graphene deposition across an entire 200mm wafer.
